| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a negative photosensitive resin composition used in a functional element in which two bases placed opposite to each other are bonded together by way of a structure obtained from the negative photosensitive resin composition, the negative photosensitive resin composition being excellent in pattern resolution and in adhesiveness of the structure to the bases. <P>SOLUTION: In the functional element in which a second base is pressure-bonded onto a first base by way of a patterned structure provided by photolithography to bond the two bases together, a resin composition for forming the structure is the negative photosensitive resin composition comprising (A) an acrylic monomer, (B) a hydrogenated product of an alkali-soluble polymer obtained by copolymerizing an unsaturated carboxylic acid and another unsaturated compound or an alkali-soluble phenolic resin, (C) a photopolymerization initiator and (D) an epoxy compound. Such a negative photosensitive resin composition has excellent pattern resolution and excels also in adhesiveness to the opposite bases. <P>COPYRIGHT: (C)2008,JPO&INPIT |
