| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation system and a lithography system which can substantially eliminate interference or speckle patterns. <P>SOLUTION: A coherent beam 506 is reflected by a rotating optical element 502 to form a second coherent beam 508. The coherent beam 508 is reflected by an angular distribution changing element 504 to form an incoherent beam 510. The incoherent beam 510 is reflected by the rotating optical element 502 to form a second incoherent beam 512. The incoherent beam 512 is received by an illuminator IL. <P>COPYRIGHT: (C)2008,JPO&INPIT |
