| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positioning method for optimizing parameter values for global alignment in an exposure device during mass production. <P>SOLUTION: This method measures the locations of alignment marks created on first and second sample shot groups of a substrate, calculates the locations of all shots including the first and second sample shot groups and settles them for substrate exposure. Then, it finds an overlapping error in the first and second sample shot groups and calculates an offset for an alignment mark location's measurement value in units of shots. In addition, it measures the locations of alignment marks created in the first sample shot group of another substrate and calculates those of alignment mark created in the second sample shot group if it is necessary to measure locations for an alternate sample shot group and then corrects the measurement value by an offset for the second sample shot group. <P>COPYRIGHT: (C)2008,JPO&INPIT |
