摘要 |
PROBLEM TO BE SOLVED: To prevent unwanted deposition substance, deposited in a chamber of an arc discharge device, from influencing the arc discharge device. SOLUTION: This arc discharge device is provided with an arc chamber body 1A; a filament 9 arranged in the arc chamber body 1A for subjecting a gas introduced to be arc-discharged; a cathode 6 arranged in the arc chamber body 1A made to face the filament 9; and a liner base formed at least on a wall surface within an upper surface, a bottom surface and the wall surface in the arc chamber body 1A. The surface of the liner base is flat, and on the surface, a lattice-like groove part 100 are formed, at least in a part adjacent to the filament. COPYRIGHT: (C)2008,JPO&INPIT
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