| 摘要 |
PROBLEM TO BE SOLVED: To provide a process control monitor regarding an interferometric modulator. SOLUTION: Process control monitors 100, 102 and 104 manufactured by using at least a part of the same process step as that used for manufacturing a MEMS device 108 are disclosed. By analyzing the process control monitors 100, 102 and 104, information on properties of the MEMS device 108 and components or sub components in the device 108 can be provided. The information can be used to identify an error in processing or optimize the MEMS device 108. In some embodiments, optical measured values can be used in the analysis of the process control monitors 100, 102 and 104. COPYRIGHT: (C)2008,JPO&INPIT
|
