| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target material for producing a base film in a high density magnetic recording medium. SOLUTION: The target material containing Cr-Mo-Cu comprising, by atom,≥60% Cr,≥5% Mo and≤10% Cu is the one compacted at 900 to 1,050°C, having a matrix structure in which Mo particles are bonded with a Cr bond phase whose width is≤5μm, and having a relative density of≥97%. Alternatively, the target material containing Cr-Mo-Cu has a componential composition containing 60 to 90% Cr, 5 to 35% Mo and 1 to 10% Cu. COPYRIGHT: (C)2008,JPO&INPIT
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