发明名称 HIGH STRENGTH SPUTTERING TARGET FOR FORMING PHOSPHOR FILM IN ELECTROLUMINESCENCE ELEMENT
摘要 Provided is a sputtering target for forming a phosphor film in an electroluminescence element, which can maintain high strength even when it is allowed to stand in the atmosphere for a long time. A target which has a chemical composition that Al: 20 to 50 mass %, Eu: 1 to 10 mass %, and the balance: Ba and inevitable impurities, and has a structure wherein Ba in which Eu is solid-solubilized and Al form an intermetallic compound phase, wherein the above intermetallic compound phase of Ba in which Eu is solid-solubilized comprises a BaAl4 intermetallic compound phase and a Ba7All3 intermetallic compound phase and Eu forms a solid solution with Ba in the above BaAl4 intermetallic compound and in the above Ba7All3 intermetallic compound, respectively.
申请公布号 KR20070112264(A) 申请公布日期 2007.11.22
申请号 KR20077023387 申请日期 2006.05.01
申请人 MITSUBISHI MATERIALS CORPORATION 发明人 ZHANG SHOUBIN;KOMIYAMA SHOJO;MISHIMA AKIFUMI
分类号 C23C14/34 主分类号 C23C14/34
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