发明名称 Method of forming a pattern and method of manufacturing a semiconductor device using the same
摘要 A method of forming a tungsten pattern includes forming a preliminary tungsten pattern on a substrate and partially removing a surface of the preliminary tungsten pattern using deionized water to form the tungsten pattern.
申请公布号 US2007269979(A1) 申请公布日期 2007.11.22
申请号 US20070656510 申请日期 2007.01.23
申请人 CHO TAI-HEUI 发明人 CHO TAI-HEUI
分类号 H01L21/8242 主分类号 H01L21/8242
代理机构 代理人
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