发明名称 CONTACT FORMATION
摘要 The present disclosure includes various method, circuit, device, and system embodiments. One such method embodiment includes creating a trench (527) in an insulator stack material (222) having a portion of the trench positioned between two of a number of gates (112) and depositing a spacer material (630) to at least one side surface of the trench. This method also includes depositing a conductive material (732, 834) into the trench and depositing a cap material into the trench.
申请公布号 WO2007098236(A3) 申请公布日期 2007.11.22
申请号 WO2007US04573 申请日期 2007.02.20
申请人 MICRON TECHNOLOGY, INC.;MATHEW, JAMES;MANNING, H., MONTGOMERY 发明人 MATHEW, JAMES;MANNING, H., MONTGOMERY
分类号 H01L21/768 主分类号 H01L21/768
代理机构 代理人
主权项
地址