| 摘要 |
A donor substrate for an LITI and a method for manufacturing an organic EL display device are provided to improve efficiency of the LITI process by adjusting a thickness of a transfer layer on the donor substrate. A donor substrate for an LITI(Laser Induced Thermal Imaging) includes a substrate(100), an optical-thermal conversion layer(110), a buffer layer(120), and a transfer layer(130). The optical-thermal conversion layer is formed on the substrate. The buffer layer is formed on the optical-thermal conversion layer. The transfer layer is formed on the buffer layer and includes a pixel electrode of a flat panel display device. A thickness of the transfer layer is between 50 and 300 angstrom. The pixel electrode is selected from the group consisting of Al, Mg, Mg-Ag, Ca, Ca-Ag, transparent electrode single layer, a double layer of a transparent electrode and Ag, or an Ag alloy, a double layer of the transparent electrode and Al or an Al alloy, and a triple layer of the transparent electrode and Ag or the Ag alloy, and Al or the Al alloy. |
