| 摘要 |
<p>A particle remover is provided to prevent expansion and contraction of a wafer by injecting gas having constant temperature onto a backside of a wafer. An injection nozzle unit(110) is installed at one of an inside of a track unit, a transfer unit, an alignment unit, and an exposure unit in order to inject gas. A gas supply unit(120) supplies the gas to be injected onto a backside of a wafer. A controller(130) controls the rotation of the injection nozzle unit during a predetermined period according to an input signal. A driving motor(140) generates power to rotate the injection nozzle unit. A power transmission unit(150) transmits the power of the driving motor in order to rotate the injection nozzle unit. A temperature controller maintains the temperature of the gas before the gas is injected through the injection nozzle unit.</p> |
