发明名称 Lithographic apparatus and device manufacturing method
摘要 An article support (2) constructed to support an article for lithographic processing purposes is disclosed. The article support includes a channel configuration (1) arranged to guide thermally stabilizing media in the article support to provide thermal stabilization to the article, wherein the channel configuration comprises an input channel structure (9) and an output channel structure (10), the input and output channel structures arranged in a nested configuration and connected to each other by a fine grid structure (11) provided at or near a surface of the article support. A lithographic apparatus and device manufacturing incorporating the article support is also disclosed.
申请公布号 EP1857881(A1) 申请公布日期 2007.11.21
申请号 EP20070107271 申请日期 2007.05.01
申请人 ASML NETHERLANDS B.V. 发明人 LOOPSTRA, ERIK ROELOF;OTTENS, JOOST JEROEN
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
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