| 摘要 |
An image sensor is provided to eliminate the necessity for a mask process and a reflow process by preparing a film on which a micro lens is formed and by attaching the film to the surface of a planarization layer. A substrate(100) is prepared which has a photodiode. An interlayer dielectric(150) is formed on the substrate. A color filter(160) is formed on the interlayer dielectric, corresponding to the photodiode. A film(190) having a micro lens(180) on its surface is attached to the surface of the color filter. A planarization layer(170) can be formed between the color filter and the film.
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