发明名称 |
Substrate cleaning method, substrate cleaning system and program storage medium |
摘要 |
<p>A substrate cleaning method can uniformly removing particles from substrates at a high removing efficiency. The substrate cleaning method includes the steps of immersing substrates W in a cleaning liquid in a cleaning tank 12, and generating ultrasonic waves in the cleaning liquid contained in the cleaning tank. A region in the cleaning tank toward which the cleaning liquid is supplied is varied with respect to a vertical level in the step of generating ultrasonic waves in the cleaning liquid while the cleaning liquid is being supplied into the cleaning tank.</p> |
申请公布号 |
EP1858059(A1) |
申请公布日期 |
2007.11.21 |
申请号 |
EP20070009836 |
申请日期 |
2007.05.16 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
WATANABE, TSUKASA;SHINDO, NAOKI;HIROSHIRO, KOUKICHI;KAMIKAWA, YUJI |
分类号 |
H01L21/00;B08B3/00;B08B3/12 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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