发明名称 METHOD FOR PRODUCING A COMPONENT
摘要 <p>An electrical and/or optical component and a process for manufacturing the component achieve especially good quality in the component and especially reliably avoid crystal dislocations in material layers of the component. In the process for producing a component, at least one trench is etched into a substrate, the trench is overgrown laterally by at least one semiconductor layer in such a way that the trench is completely covered by the semiconductor layer while forming a gas-filled, especially air-filled, cavity, and the component is integrated in the semiconductor layer or in a further semiconductor layer applied to the semiconductor layer, with an active region of the component being placed above the cavity.</p>
申请公布号 EP1856720(A2) 申请公布日期 2007.11.21
申请号 EP20060722565 申请日期 2006.03.01
申请人 TECHNISCHE UNIVERSITAET BERLIN 发明人 STRITTMATTER, ANDRE;REISSMANN, LARS;BIMBERG, DIETER
分类号 H01L21/20;H01L33/00;H01L33/20 主分类号 H01L21/20
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