发明名称 |
POSITIVE DRY FILM PHOTORESIST AND COMPOSITION FOR PREPARING THE SAME |
摘要 |
<p>A positive type photoresist resin film contains a support film and a positive photoresist resin layer laminated over the support film. The photoresist layer may be formed from a composition containing a resin, a photosensitive compound, and a first solvent having a boiling point sufficiently high such that a second solvent can be removed from the composition by heating while the first solvent is substantially retained in the composition.</p> |
申请公布号 |
EP1856577(A1) |
申请公布日期 |
2007.11.21 |
申请号 |
EP20060715801 |
申请日期 |
2006.02.01 |
申请人 |
KOLON INDUSTRIES, INC. |
发明人 |
KIM, BYOUNG-KEE;PARK, SE-HYUNG;BYUN, DAL-SEOK;SONG, SEOG-JEONG;PARK, JONG-MIN |
分类号 |
G03F7/022;G03F7/004;G03F7/023 |
主分类号 |
G03F7/022 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|