发明名称 POSITIVE DRY FILM PHOTORESIST AND COMPOSITION FOR PREPARING THE SAME
摘要 <p>A positive type photoresist resin film contains a support film and a positive photoresist resin layer laminated over the support film. The photoresist layer may be formed from a composition containing a resin, a photosensitive compound, and a first solvent having a boiling point sufficiently high such that a second solvent can be removed from the composition by heating while the first solvent is substantially retained in the composition.</p>
申请公布号 EP1856577(A1) 申请公布日期 2007.11.21
申请号 EP20060715801 申请日期 2006.02.01
申请人 KOLON INDUSTRIES, INC. 发明人 KIM, BYOUNG-KEE;PARK, SE-HYUNG;BYUN, DAL-SEOK;SONG, SEOG-JEONG;PARK, JONG-MIN
分类号 G03F7/022;G03F7/004;G03F7/023 主分类号 G03F7/022
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