发明名称 |
MERGING SUB-RESOLUTION ASSIST FEATURES OF A PHOTOLITHOGRAPHIC MASK |
摘要 |
Merging sub-resolution assist features includes receiving a mask pattern that includes the sub-resolution assist features. A first sub-resolution assist feature is selected to merge with a second sub-resolution assist feature. A merge bar width of a merge bar is established. A distance between the first sub-resolution assist feature and the second sub-resolution assist feature is determined. A merging technique is determined in accordance with the distance and the merge bar width. The first sub-resolution assist feature and the second sub-resolution assist feature are merged according to the identified merging technique. |
申请公布号 |
EP1856575(A2) |
申请公布日期 |
2007.11.21 |
申请号 |
EP20060736127 |
申请日期 |
2006.02.24 |
申请人 |
TEXAS INSTRUMENTS INCORPORATED |
发明人 |
O'BRIEN, SEAN, C.;ZHANG, GUOHONG |
分类号 |
G03C5/00;G03F1/00;G03F1/36 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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