| 摘要 |
PROBLEM TO BE SOLVED: To cope with various substrate patterns and to enhance the detection sensitivity of a foreign matter inspecting apparatus. SOLUTION: In a foreign matter inspecting apparatus equipped with a substrate stage 1, on which a substrate pattern 10 and a wafer 8 having foreign matter 11 provided on the surface thereof and having a detection lens 3 a pace filter 4, a polarizing plate 5, an optical system containing an ND filter 6 and a detector 7, two or more of fixed filter patterns 4a, 4b of line and space patterns are arranged so as to cross each other. Two or more liquid crystal filters are arranged as space filters. |
