发明名称 |
Semiconductor device with recessed L-shaped spacer and method of fabricating the same |
摘要 |
A semiconductor device with a recessed L-shaped spacer and a method for fabricating the same. A recessed L-shaped spacer includes a vertical portion and a horizontal portion. The vertical portion is disposed on lower sidewalls of a conductor pattern, exposing upper sidewalls thereof. A top spacer is on the L-shaped spacer, wherein a width ratio of the vertical portion of the L-shaped spacer to the top spacer is at least about 2:1.
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申请公布号 |
US7298011(B2) |
申请公布日期 |
2007.11.20 |
申请号 |
US20050215103 |
申请日期 |
2005.08.30 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
THEI KONG-BENG;CHENG CHUNG-LONG;CHUANG HARRY |
分类号 |
H01L29/94 |
主分类号 |
H01L29/94 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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