发明名称 Semiconductor device with recessed L-shaped spacer and method of fabricating the same
摘要 A semiconductor device with a recessed L-shaped spacer and a method for fabricating the same. A recessed L-shaped spacer includes a vertical portion and a horizontal portion. The vertical portion is disposed on lower sidewalls of a conductor pattern, exposing upper sidewalls thereof. A top spacer is on the L-shaped spacer, wherein a width ratio of the vertical portion of the L-shaped spacer to the top spacer is at least about 2:1.
申请公布号 US7298011(B2) 申请公布日期 2007.11.20
申请号 US20050215103 申请日期 2005.08.30
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 THEI KONG-BENG;CHENG CHUNG-LONG;CHUANG HARRY
分类号 H01L29/94 主分类号 H01L29/94
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