发明名称 |
Optical proximity correction method |
摘要 |
An integrated circuit layout includes dense figures and at least one isolated figure. A plurality of dummy patterns are formed to surround the isolated figure, so as to reduce the difference in pattern density of the integrated circuit layout. A transmitted light of the dummy patterns provides a phase difference of 0 or 180 degrees relative to a transmitted light of the integrated circuit layout. The integrated circuit layout and the plurality of dummy patterns are formed on a photo-mask.
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申请公布号 |
US7297450(B2) |
申请公布日期 |
2007.11.20 |
申请号 |
US20060380192 |
申请日期 |
2006.04.25 |
申请人 |
UNITED MICROELECTRONICS CORP. |
发明人 |
HWANG JIUNN-REN;HUANG JUI-TSEN;HSIEH CHANG-JYH |
分类号 |
G03F9/00;G03F1/00;G03F1/14 |
主分类号 |
G03F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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