发明名称 Debris collector for EUV light generator
摘要 A debris collector for EUV light generators is disclosed which enables to improve durabilities of optical units in a chamber including a collector mirror, to keep the vacuum degree in the chamber, and to suppress decrease in EUV light output by efficiently collecting debris bumping into the collector mirror at high speed from a target transformed into a plasma or debris adhering the collector mirror. A laser light irradiator ( 10 ) is so arranged that the irradiation direction of a laser light (L) is opposite to the traveling direction of a target ( 1 ). A debris collector ( 30 ) for collecting debris ( 3 ) is arranged in the travel path of the target ( 1 ).
申请公布号 US7297968(B2) 申请公布日期 2007.11.20
申请号 US20050554430 申请日期 2005.10.24
申请人 GIGAPHOTON, INC. 发明人 ENDO AKIRA;HOSHINO HIDEO
分类号 G21K1/00;H05G2/00;G03F7/20;G21K5/00;G21K5/02;G21K5/08;H05H1/24 主分类号 G21K1/00
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