Radiation sensitive resin composition

摘要

A radiation-sensitive resin composition comprising (A) a resin containing a structural unit of the following formula (I), (B) a resin containing a recurring unit of the following formula (II), and (C) a photoacid generator, wherein R¹ represents a substituted or unsubstituted divalent (alicyclic) hydrocarbon, R² represents a lower alkyl group or a monovalent (substituted) alicyclic hydrocarbon group, or any two R²s form in combination a divalent (substituted) alicyclic hydrocarbon group, with the remaining R² being a lower alkyl group or a monovalent (substituted) alicyclic hydrocarbon group, wherein R³ represents a hydrogen atom, fluorine atom, or trifluoromethyl group, R⁴ represents a (substituted) hydrocarbon group with a valence of (c+1), (substituted) alicyclic hydrocarbon with a valence of (c+1), or (substituted) aromatic group with a valence of (c+1), R⁵ represents a hydrogen atom or a monovalent acid-dissociable group, a and b individually represent an integer of 0-3, provided that (a+b)>=1 is satisfied, and c is an integer of 1-3. The radiation-sensitive resin composition has a high transparency at a wavelength of 193 nm or less and is particularly excellent in LER.