发明名称 |
Group III-V crystal and manufacturing method thereof |
摘要 |
A method of manufacturing a group III-V crystal is made available by which good-quality group III-V crystals are easily obtained at low cost without causing cracks, even when using a variety of substrates. A method of manufacturing a group III-V crystal, characterized in including: a step of depositing a metal film ( 2 ) on a substrate ( 1 ); a step of heat-treating the metal film ( 2 ) in an atmosphere in which a patterning compound is present; and a step of growing a group III-V crystal ( 4 ) on the metal film after the heat treatment. Additionally, a method of manufacturing a group III-V crystal, characterized in including: a step of growing a group III-V compound buffer film on the metal film after the heat treatment; and a step of growing a group III-V crystal on the group III-V compound buffer film.
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申请公布号 |
US7297625(B2) |
申请公布日期 |
2007.11.20 |
申请号 |
US20040521060 |
申请日期 |
2004.12.30 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
NAKAHATA SEIJI;UEMATSU KOJI;HIROTA RYU |
分类号 |
C30B29/40;H01L21/28;C30B25/02;C30B25/18;C30B29/38;H01L21/20;H01L21/205;H01L33/12;H01L33/32;H01L33/34;H01S5/323 |
主分类号 |
C30B29/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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