发明名称 Group III-V crystal and manufacturing method thereof
摘要 A method of manufacturing a group III-V crystal is made available by which good-quality group III-V crystals are easily obtained at low cost without causing cracks, even when using a variety of substrates. A method of manufacturing a group III-V crystal, characterized in including: a step of depositing a metal film ( 2 ) on a substrate ( 1 ); a step of heat-treating the metal film ( 2 ) in an atmosphere in which a patterning compound is present; and a step of growing a group III-V crystal ( 4 ) on the metal film after the heat treatment. Additionally, a method of manufacturing a group III-V crystal, characterized in including: a step of growing a group III-V compound buffer film on the metal film after the heat treatment; and a step of growing a group III-V crystal on the group III-V compound buffer film.
申请公布号 US7297625(B2) 申请公布日期 2007.11.20
申请号 US20040521060 申请日期 2004.12.30
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 NAKAHATA SEIJI;UEMATSU KOJI;HIROTA RYU
分类号 C30B29/40;H01L21/28;C30B25/02;C30B25/18;C30B29/38;H01L21/20;H01L21/205;H01L33/12;H01L33/32;H01L33/34;H01S5/323 主分类号 C30B29/40
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