发明名称 |
OPTICAL METROLOGY OPTIMIZATION FOR REPETITIVE STRUCTURES |
摘要 |
<p>The top-view profiles of repeating structures in a wafer are characterized and parameters to represent variations in the top-view profile of the repeating structures are selected. An optical metrology model is developed that includes the selected top-view profile parameters of the repeating structures. The optimized optical metrology model is used to generate simulated diffraction signals that are compared to measured diffraction signals.</p> |
申请公布号 |
KR20070110182(A) |
申请公布日期 |
2007.11.16 |
申请号 |
KR20067027901 |
申请日期 |
2006.02.06 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
VOUNG VI;BAO JUNWEI;BISCHOFF JOERG |
分类号 |
G01B9/02;G01B3/22;G01B11/00;G01B11/24 |
主分类号 |
G01B9/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|