发明名称 IMPROVED DIAPHRAGM FOR CHEMICAL MECHANICAL POLISHER
摘要 A diaphragm for a CMP apparatus is provided to improve the strength and ductility of a diaphragm by suitably installing the diaphragm according to a gap and a relative transfer distance between a rotation unit and a holder. An outer sealing ring(32) is mounted on the inner sidewall of a rotation unit. An inner sealing ring(36) is mounted on the outer sidewall of a holder. A connection ring(34) is installed between the outer sealing ring and the inner sealing ring. The holder is inserted into the rotation unit, and the outer sidewall of the holder adjoins the inner sidewall of the rotation unit. The width of the connection ring is designed according to a gap(d) and a maximum relative transfer distance(L) between the outer sealing ring and the inner sealing ring. The outer sealing ring, the connection ring and the inner sealing ring can be made of a rubber layer and a fiber layer, respectively.
申请公布号 KR20070110228(A) 申请公布日期 2007.11.16
申请号 KR20070107094 申请日期 2007.10.24
申请人 APPLIED MATERIALS INC. 发明人 YEH PEI WEI;LANG SUN KUO
分类号 B24B53/12;H01L21/304;B24B37/00;B24B37/04;B24B41/06;B24B53/017 主分类号 B24B53/12
代理机构 代理人
主权项
地址