发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor device capable of inhibiting the mutual short circuit of adjacent floating gates. SOLUTION: In the manufacturing method for the semiconductor device, the floating gates for a memory cell formed to a stack-gate NAND flash memory are separated along the word-line direction (ST.2). In the manufacturing method, a shallow trench is formed, and the floating gates are separated along the bit-line direction (ST.3). COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007299959(A) 申请公布日期 2007.11.15
申请号 JP20060127037 申请日期 2006.04.28
申请人 TOSHIBA CORP 发明人 OKAJIMA MUTSUMI
分类号 H01L21/8247;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
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