发明名称 PLASMA TREATMENT APPARATUS
摘要 <p>In a plasma treatment apparatus for performing plasma treatment by accommodating a substrate (11) in a treatment chamber (6), a fixed guide (12) and a movable guide (13) made of a ceramic are arrayed in an X direction (in a substrate transporting direction) for guiding both side end portions of the substrate held on a ceramic-made mounting plate (10), and both end portions of the movable guide (13) are supported by supporting members (18). In this construction, these supporting members (18) are fitted to fixed members (15A) and (15B) arranged in a Y direction with the mounting plate (10) placed therebetween, such that an interval in the Y direction is adjustable. Consequently, the ceramic-made guide member (13) can be mounted and demounted without directly bolting it, and it is possible to prevent the generation of an abnormal discharge by using as objects multiple product thin-type substrates (11) with different widthwise dimensions.</p>
申请公布号 KR20070109791(A) 申请公布日期 2007.11.15
申请号 KR20067019337 申请日期 2006.09.20
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 KORENAGA TETSUO;NAGADOME RYUJI
分类号 H01L21/3065;H01L21/02;H01L21/677 主分类号 H01L21/3065
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