| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To form fine patterns under the same exposure conditions without depending on shapes or denseness degrees of patterns. <P>SOLUTION: An outline enhancing mask 1a comprises: a transmissive substrate 2a having transmissive property for exposure light; a semi-light-shielding portion 3a formed on the transmissive substrate 2a; an opening 4a formed by opening the semi-light-shielding portion 3a and corresponding to an isolated contact pattern; and a ring-like phase shifter 5a formed between the semi-light-shielding portion 3a and the opening 4a and surrounding the opening 4a. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
