| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new exposure apparatus for obtaining a linear relational expression to approximate a measured mark position deviation amount, and to provide its method, and a device manufacturing method. <P>SOLUTION: The exposure apparatus for exposing a substrate includes: a substrate stage for holding the substrate and moving, a measuring instrument for measuring the position deviation amount of a mark on the substrate held by the substrate stage, operational equipment for obtaining the linear relational expression to approximate the plurality of position deviation amounts measured by the measuring instrument, and a controller for controlling the position of the substrate stage in response to a target position based on the relational expression in order to expose a region to be exposed on the substrate. The operational equipment obtains the relational expression by integer programming so as to allow the number of the marks to be minimum, by which a difference between the mark position deviation amount measured by the measuring instrument and the mark position deviation amount approximated by the relational expression comes to be the outside of the predetermined permission range. <P>COPYRIGHT: (C)2008,JPO&INPIT |
