| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate support with an electrostatic chuck wherein the chuck and a base are cooperated to attain regulation of a temperature profile of a substrate in a chamber. SOLUTION: The electrostatic chuck for receiving a substrate in a substrate processing chamber comprises a ceramic puck having a substrate receiving surface and an opposing backside surface with a plurality of spaced apart mesas. An electrode is embedded in the ceramic puck to generate an electrostatic force to hold a substrate. Heater coils located at peripheral and central portions of the ceramic puck allow independent control of temperatures of the central and peripheral portions of the ceramic puck. The chuck is supported by a base having a groove with retained air. COPYRIGHT: (C)2008,JPO&INPIT |
