| 发明名称 |
PHOTORESIST COMPOSITION AND PREPARATION METHOD THEREOF |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photoresist composition which forms a high contrast and high resolution pattern and excels in thermal characteristics, and a preparation method thereof. <P>SOLUTION: The photoresist composition comprises a polymer represented by formula 2 and a photoacid generator. <P>COPYRIGHT: (C)2008,JPO&INPIT |
| 申请公布号 |
JP2007299002(A) |
申请公布日期 |
2007.11.15 |
| 申请号 |
JP20070154422 |
申请日期 |
2007.06.11 |
| 申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
SANG-JUN CHOI |
| 分类号 |
G03F7/039;C08F8/12;C08F212/14;C08K5/17;C08K5/42;C08L25/18;G03F7/004;H01L21/027 |
主分类号 |
G03F7/039 |
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| 地址 |
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