发明名称 |
SURFACE CLEANING METHOD, DEVICE MANUFACTURING METHOD, CLEANING ASSEMBLY, CLEANING APPARATUS, AND LITHOGRAPHIC APPARATUS |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of effectively cleaning a surface of an optical element. <P>SOLUTION: A surface cleaning method comprises: a step of using a contaminant liberating device 40 to at least partly liberate individual contaminants from a surface 21 with a contaminant liberating beam 41, and a step of using a contaminant removing device 10 to capture the at least partly liberated individual contaminants. The contaminant removing device 10 generates at least one optical trap 15 to trap the at least partly liberated individual contaminants. <P>COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2007300096(A) |
申请公布日期 |
2007.11.15 |
申请号 |
JP20070111141 |
申请日期 |
2007.04.20 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
SINGH MANDEEP |
分类号 |
H01L21/027;B08B3/00;B08B3/10;B08B7/00 |
主分类号 |
H01L21/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|