| 摘要 |
A semiconductor manufacturing apparatus and a semiconductor substrate transfer method using the same are provided to prevent a substrate from being polluted by particles when transferring the substrate between chambers by installing a buffer unit to store for a moment the transferred substrate. A semiconductor manufacturing apparatus comprises process chambers(400), a load lock chamber(300), a transfer robot(510), a transfer chamber(500) and a buffer unit(600). The load lock chamber takes substrates to be transferred to the process chambers. The transfer chamber is installed between the load lock chamber and the process chambers, and comprises the transfer robot for transferring the substrates between the load lock chamber and the process chambers. The buffer unit stores the substrate unloaded from the process chambers to the transfer chamber.
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