| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for efficiently forming a high-resolution pattern having a high aspect ratio while suppressing consumption of functional ink. <P>SOLUTION: The method for forming a high-resolution pattern includes steps of (a) attaching a sacrificial film 30 on a substrate 10, (b) exposing and developing the sacrificial film 30 to form a pattern template 30' having a desired patterned concave portion 40, (c) filling the patterned concave portion 40 with ink M containing a functional material, and (d) drying the ink M, wherein the thickness of the sacrificial film 30 is set to 100×β/α or more (wherein α represents a volume fraction (vol%) of the functional material in the ink M and β represents the thickness (μm) of the high-resolution pattern). <P>COPYRIGHT: (C)2008,JPO&INPIT |
