发明名称 Pixel with asymmetric transfer gate channel doping
摘要 A pixel including a substrate of a first conductivity type and having a surface, a photodetector of a second conductivity type that is opposite the first conductivity type, a floating diffusion region of the second conductivity type, a transfer region between the photodetector and the floating diffusion, a gate positioned above the transfer region and partially overlapping the photodetector, and a pinning layer of the first conductivity type extending at least across the photodetector from the gate. A channel implant of the first conductivity type extending from between a midpoint of the transfer gate and the floating diffusion to at least across the photodiode and having a dopant concentration such that a dopant concentration of the transfer region is greater proximate to the photodetector than the floating diffusion, and wherein a peak dopant concentration of the channel implant is at a level and at a depth below the surface such that a partially-buried channel is formed in the transfer region between the photodiode and floating diffusion when the transfer gate is energized.
申请公布号 US2007262355(A1) 申请公布日期 2007.11.15
申请号 US20070707848 申请日期 2007.02.16
申请人 PALSULE CHINTAMANI P;CHOI CHANGHOON;LAMASTER FREDRICK P;STANBACK JOHN H;DUNGAN THOMAS E;JOY THOMAS;HADDAD HOMAYOON 发明人 PALSULE CHINTAMANI P.;CHOI CHANGHOON;LAMASTER FREDRICK P.;STANBACK JOHN H.;DUNGAN THOMAS E.;JOY THOMAS;HADDAD HOMAYOON
分类号 H01L27/148 主分类号 H01L27/148
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