OPTICAL SYSTEM FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

An optical system within a semiconductor exposure equipment is provided to reduce exchange period of a diffraction plate by applying a diffraction plate exchange device which rotates a plurality of diffraction plates toward one direction, and simultaneously exchanges the diffraction plates transmitted by the light from a light source. A light source(100) produces a beam light(700) having a predetermined single wavelength. An objective optical lens(400) is formed adjacently to a target for receiving the beam light from the light source, and gathers the beam light and project it. A light guide unit(200) transmits the beam light between the light source and the objective optical lens. A plurality of diffraction plates(800) comprise at least one or more holes for passing the transmitted light from the light guide unit, and make the transmitted light diffracted. A diffraction exchange apparatus(600) is formed to exchange the plural diffraction plates different from each other on an optical path transmitted through the light guide unit to diffract the beam light selectively.