METAL POLISHING COMPOSITION, AND CHEMICAL-MECHANICAL POLISHING METHOD USING IT

摘要

PROBLEM TO BE SOLVED: To provide a metal polishing composition and a chemical-mechanical polishing method using it, which suppresses dishing or erosion with high cleaning property after polishing.

SOLUTION: The metal polishing composition contains (a) abrasive grain obtained by surface-modifying colloidal silica using ulmin acid ion or boric acid ion, and (b) a complex aromatic ring compound which comprises anionic substituent with three or more nitrogen atoms contained in molecule.

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