ULTRASONIC DEVICE FOR CLEANING AND ULTRASONIC CLEANING SYSTEM USING THE SAME

摘要

A cleaning ultrasonic device and an ultrasonic cleaning system using the same are provided to maximize cleaning effect by modifying a shape of cleaning bath and installing a reflector in the cleaning bath. An apparatus for cleaning a semiconductor wafer includes a cleaning bath(30) with integrating sphere, a plurality of ultrasonic devices(41), and a power line(31). The cleaning bath which is empty inside and has opening part. The plurality of ultrasonic devices are attached to an outer surface of the cleaning bath. The power line is connected to the ultrasonic devices in order to supply power to the ultrasonic devices. The cleaning bath is formed with integrating sphere or a dumbbell shape or a cylinder shape.