发明名称 FEEDING MECHANISM FOR CONTINUOUS PROCESSING OF ELONGATE BASE MATERIAL, PROCESSING APPARATUS AND THIN FILM FORMING APPARATUS USING THE SAME, AND ELONGATE MEMBER PRODUCED THEREBY
摘要 <p>A feeding device for controlling an elongated base material continuously, a control device thereof, a thin film forming device, and an elongated member are provided to feed the elongated base material at constant speed by giving adequate tensile force to the base material and to improve size accuracy of a longitudinal direction for the base material favorably. A feeding device for controlling an elongated base material includes a base ground supplying the elongated base material(1) continually and controlling the elongated base material physically and chemically at predetermined speed. The base material receives tensile force(T1) of an opposite direction for a feeding direction from a returning direction for the base ground, frictional force(F) from the base ground, and the tensile force(T2) of the feeding direction from the returning direction of the base ground, separately. F is larger than T1, and T1 is larger than T2. Deviation of thickness for the elongated base material at a longitudinal direction for a surface layer formed through whole length of the base material is in a range of ±10% of an average value.</p>
申请公布号 KR20070109841(A) 申请公布日期 2007.11.15
申请号 KR20070042898 申请日期 2007.05.03
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 AWATA HIDEAKI;EMURA KATSUJI;YOSHIDA KENTARO;OKUDA NOBUYUKI;NAKAMURA JUN
分类号 G11B5/85;B65H20/02;C23C14/56 主分类号 G11B5/85
代理机构 代理人
主权项
地址