发明名称 VARIABLE RESISTANCE MEMORY ELEMENT HAVING BUFFER LAYER FORMED ON LOWER ELECTRODE
摘要 <P>PROBLEM TO BE SOLVED: To provide a variable resistance memory element having a buffer layer formed on a lower electrode. <P>SOLUTION: A non-volatile memory device including a variable resistance material has a lower electrode 20, a buffer layer 22 which is formed of an oxide on the lower electrode, an oxidation layer 24 which is formed on the buffer layer and has variable resistance characteristics, and an upper electrode 26 formed on the oxidation layer. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007300082(A) 申请公布日期 2007.11.15
申请号 JP20070096788 申请日期 2007.04.02
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 BOURIM EL MOSTAFA;LEE EUN-HONG;CHO CHOONG-RAE
分类号 H01L27/10;H01L45/00;H01L49/00 主分类号 H01L27/10
代理机构 代理人
主权项
地址