发明名称 Nanoscale Fet
摘要 A transistor device is formed of a continuous linear nanostructure having a source region, a drain region and a channel region between the source and drain regions. The source ( 20 ) and drain ( 26 ) regions are formed of nanowire ania the channel region ( 24 ) is in the form of a nanotube. An insulated gate ( 32 ) is provided adjacent to the channel region ( 24 ) for controlling conduction i ni the channel region between the source and drain regions.
申请公布号 US2007262397(A1) 申请公布日期 2007.11.15
申请号 US20050632738 申请日期 2005.07.12
申请人 KONINKLIJKE PHILIPS ELECTRONICS N.V. 发明人 SURDEANU RADU;AGARWAL PRABHAT;BALKENENDE ABRAHAM R.;BAKKERS ERIK P.
分类号 H01L29/775;H01L21/336;H01L29/06;H01L29/20;H01L29/76;H01L29/78 主分类号 H01L29/775
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