发明名称 |
Nanoscale Fet |
摘要 |
A transistor device is formed of a continuous linear nanostructure having a source region, a drain region and a channel region between the source and drain regions. The source ( 20 ) and drain ( 26 ) regions are formed of nanowire ania the channel region ( 24 ) is in the form of a nanotube. An insulated gate ( 32 ) is provided adjacent to the channel region ( 24 ) for controlling conduction i ni the channel region between the source and drain regions.
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申请公布号 |
US2007262397(A1) |
申请公布日期 |
2007.11.15 |
申请号 |
US20050632738 |
申请日期 |
2005.07.12 |
申请人 |
KONINKLIJKE PHILIPS ELECTRONICS N.V. |
发明人 |
SURDEANU RADU;AGARWAL PRABHAT;BALKENENDE ABRAHAM R.;BAKKERS ERIK P. |
分类号 |
H01L29/775;H01L21/336;H01L29/06;H01L29/20;H01L29/76;H01L29/78 |
主分类号 |
H01L29/775 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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