发明名称 Patterning by energetically-stimulated local removal of solid-condensed-gas layers and solid state chemical reactions produced with such layers
摘要 The invention provides a method for forming a patterned material layer on a structure, by condensing a vapor to a solid condensate layer on a surface of the structure and then localized removal of selected regions of the condensate layer by directing a beam of energy at the selected regions. The structure can then be processed, with at least a portion of the patterned solid condensate layer on the structure surface, and then the solid condensate layer removed. Further there can be stimulated localized reaction between the solid condensate layer and the structure by directing a beam of energy at at least one selected region of the condensate layer.
申请公布号 US2007262050(A1) 申请公布日期 2007.11.15
申请号 US20040008402 申请日期 2004.12.09
申请人 GOLOVCHENKO JENE A;KING GAVIN M;SCHURMANN GREGOR M;BRANTON DANIEL 发明人 GOLOVCHENKO JENE A.;KING GAVIN M.;SCHURMANN GREGOR M.;BRANTON DANIEL
分类号 C03C25/68;B44C1/22;B81C99/00 主分类号 C03C25/68
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