| 摘要 |
The invention relates to a measuring arrangement for the optical monitoring of coating processes in a vacuum chamber. According to said method, the light source is arranged inside the vacuum chamber, between the substrate holder and a diaphragm arranged beneath the substrate holder, and the light receiving unit is arranged outside the vacuum chamber, in the beam path of the light source. Said substrate holder is embodied in such a way as to receive at least one substrate and can be displaced in the vacuum chamber over a coating source, preferably rotated about an axis. The substrate or substrates cross the beam path between the light source and the light receiving unit for transmission measurement purposes, and the diaphragm covers a measuring region over the coating source. |
