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发明名称
Patterning masks and methods
摘要
Patterning masks and methods for lithography are disclosed. A preferred embodiment includes a lithography mask comprising a pattern for at least one feature and at least one polarizing element.
申请公布号
US2007264581(A1)
申请公布日期
2007.11.15
申请号
US20060430607
申请日期
2006.05.09
申请人
SCHWARZ CHRISTIAN J
发明人
SCHWARZ CHRISTIAN J.
分类号
G03C5/00;G03F1/00
主分类号
G03C5/00
代理机构
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