发明名称 |
INSPECTION APPARATUS OF FPD PATTERN UNDERGOING FIRING USING EMISSIVITY OF THE PATTERN |
摘要 |
An apparatus for inspecting a flat panel display pattern firing using emissivity of the pattern is provided to find out a firing state of the pattern in a non-contact and nondestructive manner during a firing process. An emissivity measuring unit measures emissivity of a flat panel display pattern(112) formed on a substrate(110). A comparator compares the measured emissivity with a preset reference value, and judges whether the flat panel display pattern is properly fired if the compared result is within a predetermined range. The emissivity measuring unit has a probe(120) irradiating light onto the flat panel display pattern and receiving the light reflected from the flat panel display pattern, and an emissivity calculator(150) calculating the emissivity.
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申请公布号 |
KR20070109663(A) |
申请公布日期 |
2007.11.15 |
申请号 |
KR20060042975 |
申请日期 |
2006.05.12 |
申请人 |
KORNIC SYSTEMS CORP. |
发明人 |
HEO, JAE YOUNG;NAM, WON SIK;JANG, SUNG WOOK;YEON, JUNG RYUN |
分类号 |
H01J9/42;H01J11/20 |
主分类号 |
H01J9/42 |
代理机构 |
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