发明名称 INSPECTION APPARATUS OF FPD PATTERN UNDERGOING FIRING USING EMISSIVITY OF THE PATTERN
摘要 An apparatus for inspecting a flat panel display pattern firing using emissivity of the pattern is provided to find out a firing state of the pattern in a non-contact and nondestructive manner during a firing process. An emissivity measuring unit measures emissivity of a flat panel display pattern(112) formed on a substrate(110). A comparator compares the measured emissivity with a preset reference value, and judges whether the flat panel display pattern is properly fired if the compared result is within a predetermined range. The emissivity measuring unit has a probe(120) irradiating light onto the flat panel display pattern and receiving the light reflected from the flat panel display pattern, and an emissivity calculator(150) calculating the emissivity.
申请公布号 KR20070109663(A) 申请公布日期 2007.11.15
申请号 KR20060042975 申请日期 2006.05.12
申请人 KORNIC SYSTEMS CORP. 发明人 HEO, JAE YOUNG;NAM, WON SIK;JANG, SUNG WOOK;YEON, JUNG RYUN
分类号 H01J9/42;H01J11/20 主分类号 H01J9/42
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