Vertical positioning of an optoelectronical component on a carrier relative to an optical conductor integrated on this carrier

摘要

The support includes a lower confinement layer (101) of silica deposited on a silicon base layer (100) and covered by a core (102). The layers are etched to reveal the rough outline of the optical guides and a sacrificial stop layer is deposited on the preceding layers and etched away except on support zones. The upper confinement layer (120) is then deposited and etched to form the guides (124, 126). The stop layer is then removed to reveal the support zones which position the component (130). The zones are, dependent on the manufacturing, at one of the following levels: the top of the core, an intermediate plane between the base and top of the core, the top of the lower confinement layer, or an intermediate plane in the lower confinement layer.