| 摘要 |
A positive-working electron beam or X-ray resist composition comprising:(a) a compound capable of generating an acid by irradiation of an electron beam or X-ray;(b) a resin containing a group which is decomposable by action of an acid to increase solubility in an alkali developing solution or (e) a resin insoluble in water and soluble in the alkali developing solution; and(c) a fluorine and/or silicon surfactant,the compound capable of generating an acid by irradiation of an electron beam or X-ray being a compound which generates benzenesulfonic acid, naphthalenesulfonic acid or anthracenesulfonic acid which is substituted by at least one fluorine atom and/or at least one group containing a fluorine atom. |
