| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition having satisfactory transmittance when a light source of ≤160 nm, concretely F<SB>2</SB>excimer laser light (157 nm) is used and having high sensitivity, high resolution and excellent contact property to a developer. <P>SOLUTION: The positive resist composition comprises (A) a resin having at least one repeating unit having a group -SO<SB>2</SB>-O-, further having at least one repeating unit having a fluorine atom and an acid-decomposable group, and having solubility in an alkali developer increased by the action of an acid and (B) a compound which generates an acid upon irradiation with an actinic ray or a radiation. <P>COPYRIGHT: (C)2004,JPO |
