发明名称 Dual stage defect region identification and defect detection method and apparatus
摘要 A method and apparatus for inspecting patterned substrates, such as photomasks, for unwanted particles and features occurring on the transmissive as well as pattern defects. A transmissive substrate is illuminated by a laser through an optical system comprised of a laser scanning system, individual transmitted and reflected light collection optics and detectors collect and generate signals representative of the light transmitted and reflected by the substrate. The defect identification of the substrate is performed using transmitted and reflected light signals from a baseline comparison between two specimens, or one specimen and a database representation, to form a calibration pixelated training set including a non-defective region. This calibration pixilated training set is compared to a transmitted-reflected plot map of the subject specimen to assess surface quality.
申请公布号 US7295301(B2) 申请公布日期 2007.11.13
申请号 US20060430681 申请日期 2006.05.08
申请人 发明人
分类号 G01N21/88 主分类号 G01N21/88
代理机构 代理人
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