发明名称 DIAGNOSTIC DEVICE AND METHOD OF MEASURING QUANTITY OF PRECURSOR FOR CVD PROCESS
摘要 A diagnostic device and a method of measuring residual quantity of precursors within a receptacle in a CVD process are provided to prevent damage due to lack of precursors by measuring a water level of the precursors in a real-time period. A bombe(100) is formed to store a carrier gas(100a). One side of a first pipe(110) is connected to the bombe in order to transfer the carrier gas. A receptacle(200) is formed to store a liquefied precursor(200a). The other side of the first pipe is dipped into the precursor in order to bubble and evaporate the precursor by using the transfer gas. A second pipe(210) is arranged on a surface of water in order to transfer the precursor and the carrier gas. One side of the second pipe is connected to the receptacle. A reactor(300) is connected to the other side of the second pipe in order to deposit the precursor on a wafer(300a) by performing a chemical deposition process. An ultrasonic sensor unit(410) transmits ultrasonic waves to the surface of the water and delays and receives the ultrasonic waves reflected from the surface of the water. An ultrasonic control unit(420) filters a threshold voltage and, applies and controls an alarm output signal.
申请公布号 KR20070108727(A) 申请公布日期 2007.11.13
申请号 KR20060041113 申请日期 2006.05.08
申请人 KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE 发明人 YOON, JOO YOUNG;SIN, YONG HYEON;JEONG, GWANG HWA
分类号 H01L21/02;H01L21/205 主分类号 H01L21/02
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